Bayansal, F.Sahin, O.Cetinkara, H. A.2024-09-182024-09-1820200040-6090https://doi.org/10.1016/j.tsf.2020.137839https://hdl.handle.net/20.500.12483/9103Lithium-doped CuO thin films with different concentrations are deposited by the Successive Ionic Layer Adsorption and Reaction technique on glass substrates. The films are characterized by scanning electron microscopy, X-ray diffraction, Raman spectroscopy, UV-Vis. Spectroscopy, nanoindentation and in-situ scanning probe microscopy. Scanning electron microscopy showed uniform film surface and smaller particle size with increasing Li concentration. X-ray diffraction patterns revealed decreasing crystallite size with increasing Li concentration. The Raman spectra revealed CuO phases and a secondary phase of Cu2O at high doping concentrations especially after the concentration of 1.0 at.% Li. UV-Vis. Spectroscopy results indicated that the transmittance and bandgap values could be modified with Li-doping. Both of them are found to be increasing with increasing Li concentration. All indentation test load curves exhibited a smooth shape without any detected pop-in. The results of the nanoindentation test revealed that the nanohardness and elastic modulus increased with Li-doping.eninfo:eu-repo/semantics/closedAccessCopper oxideThin filmsLithium dopingSILAR techniqueNanostructured materialsNanoindentationMechanical and structural properties of Li-doped CuO thin films deposited by the Successive Ionic Layer Adsorption and Reaction methodArticle69710.1016/j.tsf.2020.1378392-s2.0-85078955057Q2WOS:000522652700031Q3