Mechanical and structural properties of Li-doped CuO thin films deposited by the Successive Ionic Layer Adsorption and Reaction method

Basit Öğe Kaydı
dc.authoridBayansal, Fatih/0000-0001-9600-007X
dc.contributor.authorBayansal, F.
dc.contributor.authorSahin, O.
dc.contributor.authorCetinkara, H. A.
dc.date.accessioned2024-09-18T20:13:20Z
dc.date.available2024-09-18T20:13:20Z
dc.date.issued2020
dc.departmentHatay Mustafa Kemal Üniversitesien_US
dc.description.abstractLithium-doped CuO thin films with different concentrations are deposited by the Successive Ionic Layer Adsorption and Reaction technique on glass substrates. The films are characterized by scanning electron microscopy, X-ray diffraction, Raman spectroscopy, UV-Vis. Spectroscopy, nanoindentation and in-situ scanning probe microscopy. Scanning electron microscopy showed uniform film surface and smaller particle size with increasing Li concentration. X-ray diffraction patterns revealed decreasing crystallite size with increasing Li concentration. The Raman spectra revealed CuO phases and a secondary phase of Cu2O at high doping concentrations especially after the concentration of 1.0 at.% Li. UV-Vis. Spectroscopy results indicated that the transmittance and bandgap values could be modified with Li-doping. Both of them are found to be increasing with increasing Li concentration. All indentation test load curves exhibited a smooth shape without any detected pop-in. The results of the nanoindentation test revealed that the nanohardness and elastic modulus increased with Li-doping.en_US
dc.description.sponsorshipMustafa Kemal University Scientific Research Commission [12662, 9362]en_US
dc.description.sponsorshipWe are grateful to Mustafa Kemal University Scientific Research Commission for the financial support for the projects no. 12662 and 9362.en_US
dc.identifier.doi10.1016/j.tsf.2020.137839
dc.identifier.issn0040-6090
dc.identifier.scopus2-s2.0-85078955057en_US
dc.identifier.scopusqualityQ2en_US
dc.identifier.urihttps://doi.org/10.1016/j.tsf.2020.137839
dc.identifier.urihttps://hdl.handle.net/20.500.12483/9103
dc.identifier.volume697en_US
dc.identifier.wosWOS:000522652700031en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevier Science Saen_US
dc.relation.ispartofThin Solid Filmsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectCopper oxideen_US
dc.subjectThin filmsen_US
dc.subjectLithium dopingen_US
dc.subjectSILAR techniqueen_US
dc.subjectNanostructured materialsen_US
dc.subjectNanoindentationen_US
dc.titleMechanical and structural properties of Li-doped CuO thin films deposited by the Successive Ionic Layer Adsorption and Reaction methoden_US
dc.typeArticleen_US

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