Deposition of PbS thin films using a continuous flow reactor: Comparison of the modified technique with conventional methods in the coating of PbS thin film on the substrate

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dc.authoridYucel, Yasin/0000-0002-8572-4213
dc.contributor.authorYucel, Ersin
dc.contributor.authorYucel, Yasin
dc.date.accessioned2024-09-18T20:54:07Z
dc.date.available2024-09-18T20:54:07Z
dc.date.issued2022
dc.departmentHatay Mustafa Kemal Üniversitesien_US
dc.description.abstractA reactor was designed to coat the PbS thin film on glass substrate by continuous flow. A methodology is proposed to deposit PbS films based on reducing the roughness via a laminar and continuous flow in the reactor without being affected by the chaotic properties of the turbulent flow. The modified coating method was named flow-through chemical deposition (FTCD). The morphological analysis demonstrated that the surface roughness of PbS films deposited by the FTCD method was lower than the other films. The wetting behaviour of PbS surfaces is consistent with the roughness of the PbS layers coated on the substrate. The results revealed that the properties of the films were influenced from the deposition method, the substrate position and the movement of the chemical solution in the reaction medium. The developed innovative approach has shown promising results for the chemical synthesis of PbS films in the context of surface modification.en_US
dc.identifier.doi10.1016/j.jics.2022.100706
dc.identifier.issn0019-4522
dc.identifier.issue10en_US
dc.identifier.scopus2-s2.0-85137644524en_US
dc.identifier.scopusqualityQ3en_US
dc.identifier.urihttps://doi.org/10.1016/j.jics.2022.100706
dc.identifier.urihttps://hdl.handle.net/20.500.12483/11593
dc.identifier.volume99en_US
dc.identifier.wosWOS:000863317900003en_US
dc.identifier.wosqualityQ4en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.relation.ispartofJournal of The Indian Chemical Societyen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectPbS thin filmsen_US
dc.subjectContinuous flow reactoren_US
dc.subjectRoughnessen_US
dc.subjectSILARen_US
dc.subjectCBDen_US
dc.subjectWettabilityen_US
dc.titleDeposition of PbS thin films using a continuous flow reactor: Comparison of the modified technique with conventional methods in the coating of PbS thin film on the substrateen_US
dc.typeArticleen_US

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