Chiral metamaterial design using optimized pixelated inclusions with genetic algorithm

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dc.authoridkaraaslan, muharrem/0000-0003-0923-1959
dc.authoridOZER, Zafer/0000-0001-7118-938X
dc.contributor.authorAkturk, Cemal
dc.contributor.authorKaraaslan, Muharrem
dc.contributor.authorOzdemir, Ersin
dc.contributor.authorOzkaner, Vedat
dc.contributor.authorDincer, Furkan
dc.contributor.authorBakir, Mehmet
dc.contributor.authorOzer, Zafer
dc.date.accessioned2024-09-18T20:32:48Z
dc.date.available2024-09-18T20:32:48Z
dc.date.issued2015
dc.departmentHatay Mustafa Kemal Üniversitesien_US
dc.description.abstractChiral metamaterials have been a research area for many researchers due to their polarization rotation properties on electromagnetic waves. However, most of the proposed chiral metamaterials are designed depending on experience or time-consuming inefficient simulations. A method is investigated for designing a chiral metamaterial with a strong and natural chirality admittance by optimizing a grid of metallic pixels through both sides of a dielectric sheet placed perpendicular to the incident wave by using a genetic algorithm (GA) technique based on finite element method solver. The effective medium parameters are obtained by using constitutive equations and S parameters. The proposed methodology is very efficient for designing a chiral metamaterial with the desired effective medium parameters. By using GA-based topology, it is proven that a chiral metamaterial can be designed and manufactured more easily and with a low cost. (C) 2015 Society of Photo-Optical Instrumentation Engineers (SPIE)en_US
dc.description.sponsorshipTUBITAK [113E290, 114E295]; Turkish Academy of Sciencesen_US
dc.description.sponsorshipM.K. acknowledges the support of TUBITAK under the Projects Nos. 113E290 and 114E295 partial support of the Turkish Academy of Sciences. Also, the authors would like to thank editors and anonymous reviewers for their suggestions to improve this paper.en_US
dc.identifier.doi10.1117/1.OE.54.3.035106
dc.identifier.issn0091-3286
dc.identifier.issn1560-2303
dc.identifier.issue3en_US
dc.identifier.scopus2-s2.0-84925435244en_US
dc.identifier.scopusqualityQ2en_US
dc.identifier.urihttps://doi.org/10.1117/1.OE.54.3.035106
dc.identifier.urihttps://hdl.handle.net/20.500.12483/11137
dc.identifier.volume54en_US
dc.identifier.wosWOS:000351587500034en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherSpie-Soc Photo-Optical Instrumentation Engineersen_US
dc.relation.ispartofOptical Engineeringen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectmetamaterialsen_US
dc.subjectchiralen_US
dc.subjectleft-handed metamaterialsen_US
dc.subjectgenetic algorithmen_US
dc.titleChiral metamaterial design using optimized pixelated inclusions with genetic algorithmen_US
dc.typeArticleen_US

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