Use of n-type semiconductor silicon as substrate material for electrodeposition of Zn1-xFex alloy thin films

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dc.authoridbedir, metin/0000-0001-7772-3635
dc.contributor.authorIlimbey, Ismail
dc.contributor.authorYurdal, Kagan
dc.contributor.authorBakkaloglu, Omer Faruk
dc.contributor.authorKarahan, Ismail Hakki
dc.contributor.authorBedir, Metin
dc.date.accessioned2024-09-18T20:16:46Z
dc.date.available2024-09-18T20:16:46Z
dc.date.issued2014
dc.departmentHatay Mustafa Kemal Üniversitesien_US
dc.description9th Nanoscience and Nanotechnology Conference (NANOTR) -- JUN 24-28, 2013 -- Erzurum, TURKEYen_US
dc.description.abstractZn1-xFex alloys were electrochemically deposited on semiconductor silicon substrates from sulfate bath. Effect of bath composition on phase formation, chemical composition, crystallite shape, electrical resistivity and magnetoresistance were investigated using appropriate characterization tools. It was shown that Zn-Fe alloys can be successfully deposited directly on semiconductor silicon substrate using electrodeposition technique. Iron content in films influences crystallite size, resistivity and magnetoresistance of films. (C) 2014 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.apsusc.2014.06.122
dc.identifier.endpage308en_US
dc.identifier.issn0169-4332
dc.identifier.issn1873-5584
dc.identifier.scopus2-s2.0-84908368055en_US
dc.identifier.scopusqualityQ1en_US
dc.identifier.startpage305en_US
dc.identifier.urihttps://doi.org/10.1016/j.apsusc.2014.06.122
dc.identifier.urihttps://hdl.handle.net/20.500.12483/9734
dc.identifier.volume318en_US
dc.identifier.wosWOS:000344380500053en_US
dc.identifier.wosqualityQ1en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevier Science Bven_US
dc.relation.ispartofApplied Surface Scienceen_US
dc.relation.publicationcategoryKonferans Öğesi - Uluslararası - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectElectrodepositionen_US
dc.subjectZn-Fe alloysen_US
dc.subjectSilicon substrateen_US
dc.subjectMagnetoresistanceen_US
dc.subjectThin filmen_US
dc.titleUse of n-type semiconductor silicon as substrate material for electrodeposition of Zn1-xFex alloy thin filmsen_US
dc.typeConference Objecten_US

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