Computer assisted optimization of copper sulphide thin film coating parameters on glass substrates

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dc.authoridYucel, Yasin/0000-0002-8572-4213
dc.contributor.authorYucel, Ersin
dc.contributor.authorYucel, Yasin
dc.contributor.authorGokhan, Didem
dc.date.accessioned2024-09-18T20:13:40Z
dc.date.available2024-09-18T20:13:40Z
dc.date.issued2015
dc.departmentHatay Mustafa Kemal Üniversitesien_US
dc.description.abstractIn this work, copper sulphide (CuS) thin films were deposited on glass substrates by chemical bath deposition method under different pH, deposition temperature, stirring speed and deposition time. The effects of process parameters, such as pH from 1.8 to 2.2, deposition temperature from 30 to 50 degrees C, stirring speed from 50 to 250 rpm and deposition time from 8 to 40 h on the band gap, were optimized by central composite design (CCD) of response surface methodology (RSM). Five-level-four-factor CCD was employed to evaluate the effects of the deposition parameters on the band gap of CuS thin films. A quadratic model was established as a functional relationship between four independent variables and the band gap. Analysis of variance revealed that the proposed model was adequate. The optimum pH, deposition temperature, stirring speed and deposition time were found to be 2.10, 44.33 degrees C, 200 rpm, and 32h, respectively. Under these conditions, the experimental band gap of CuS was observed as 2.74 eV, which was well in close agreement with predicted value (2.71 eV) by the model. (C) 2015 Elsevier B.V. All rights reserved.en_US
dc.description.sponsorshipScientific Research Commission of Mustafa Kemal University [11700]en_US
dc.description.sponsorshipThis work is financially supported by the Scientific Research Commission of Mustafa Kemal University (Project No: 11700).en_US
dc.identifier.doi10.1016/j.apsusc.2015.06.031
dc.identifier.endpage910en_US
dc.identifier.issn0169-4332
dc.identifier.issn1873-5584
dc.identifier.scopus2-s2.0-84954441943en_US
dc.identifier.scopusqualityQ1en_US
dc.identifier.startpage904en_US
dc.identifier.urihttps://doi.org/10.1016/j.apsusc.2015.06.031
dc.identifier.urihttps://hdl.handle.net/20.500.12483/9314
dc.identifier.volume351en_US
dc.identifier.wosWOS:000359496600115en_US
dc.identifier.wosqualityQ1en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.relation.ispartofApplied Surface Scienceen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectCuSen_US
dc.subjectThin filmen_US
dc.subjectChemical bath depositionen_US
dc.subjectOptimizationen_US
dc.subjectResponse surface methodologyen_US
dc.titleComputer assisted optimization of copper sulphide thin film coating parameters on glass substratesen_US
dc.typeArticleen_US

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