Influence of coumarin as an additive on CuO nanostructures prepared by successive ionic layer adsorption and reaction (SILAR) method

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dc.authoridSahin, Bunyamin/0000-0001-7059-0315
dc.authoridBIYIKLI, Necmi/0000-0001-9387-5145
dc.authoridBayansal, Fatih/0000-0001-9600-007X
dc.contributor.authorBayansal, F.
dc.contributor.authorSahin, B.
dc.contributor.authorYuksel, M.
dc.contributor.authorBiyikli, N.
dc.contributor.authorCetinkara, H. A.
dc.contributor.authorGuder, H. S.
dc.date.accessioned2024-09-18T20:13:39Z
dc.date.available2024-09-18T20:13:39Z
dc.date.issued2013
dc.departmentHatay Mustafa Kemal Üniversitesien_US
dc.description.abstractThe effect of coumarin doping during the growth of CuO nanostructures by SILAR method has been studied. It was found that coumarin consider ably influences the growth process, manipulates the band-gap and modifies the crystallite size of the films. XRD experiments evidenced that with higher coumarin concentrations in the growth solution, the microstrain and dislocation density increased, while the crystallite size of the films decreased. SEM images revealed that the thicknesses of the plate-like nanostructures decreased with increasing coumarin concentration. By UV/vis spectrophotometer analysis it is found that the coumarin concentration affects both the optical band gap and the transmission rate: both the band gap and spectral transmittance values of the films decreased for higher coumarin content. (C) 2013 Elsevier B. V. All rights reserved.en_US
dc.description.sponsorshipScientific Research Commission of Mustafa Kemal University [1001 M 0115]; Marie Curie International Reintegration Grant (IRG) [PIRG05-GA-2009-249196]en_US
dc.description.sponsorshipThis work is financially supported by the Scientific Research Commission of Mustafa Kemal University (Project No: 1001 M 0115). N.B. acknowledges Marie Curie International Reintegration Grant (IRG) for funding NEMSmart (PIRG05-GA-2009-249196) project.en_US
dc.identifier.doi10.1016/j.jallcom.2013.03.018
dc.identifier.endpage82en_US
dc.identifier.issn0925-8388
dc.identifier.issn1873-4669
dc.identifier.scopus2-s2.0-84875920819en_US
dc.identifier.scopusqualityQ1en_US
dc.identifier.startpage78en_US
dc.identifier.urihttps://doi.org/10.1016/j.jallcom.2013.03.018
dc.identifier.urihttps://hdl.handle.net/20.500.12483/9306
dc.identifier.volume566en_US
dc.identifier.wosWOS:000317817200014en_US
dc.identifier.wosqualityQ1en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevier Science Saen_US
dc.relation.ispartofJournal of Alloys and Compoundsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectCuOen_US
dc.subjectSILARen_US
dc.subjectBand gap energyen_US
dc.subjectCoumarinen_US
dc.titleInfluence of coumarin as an additive on CuO nanostructures prepared by successive ionic layer adsorption and reaction (SILAR) methoden_US
dc.typeArticleen_US

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