Effect of Cu concentration on the formation of Cu1-x Znx shape memory alloy thin films
Loading...
Date
2014
Authors
Journal Title
Journal ISSN
Volume Title
Publisher
Elsevier Science Bv
Access Rights
info:eu-repo/semantics/closedAccess
Abstract
The CuxZn1-x (x = 0.06, 0.08, 0.1) deposits were fabricated by a electrodeposition method. The structural and electrical properties of the films were investigated by cyclic voltammetry (CV), X-ray diffraction (XRD), Scanning electron micrograph (SEM), and DC resistivity measurements. Phase identification of the samples was studied by the XRD patterns. XRD patterns shows the characteristics XRD peaks corresponding to the, beta, and gamma phases. The grain sizes of the samples were decreased whereas microstrain increased with the increase in Cu2+ substitution. The SEM study reveals the fine particle nature of the samples with increasing Cu content. DC resistivity indicates the metallic nature of the prepared samples. It has been found that the Cu ions have a critical influence on the resultant structure and resistivity properties of the Cu-Zn samples. (C) 2014 Elsevier B.V. All rights reserved.
Description
9th Nanoscience and Nanotechnology Conference (NANOTR) -- JUN 24-28, 2013 -- Erzurum, TURKEY
Keywords
Electrodeposition, Cu-Zn alloy, Electrical property, Shape memory alloys
Journal or Series
Applied Surface Science
WoS Q Value
Q1
Scopus Q Value
Q1
Volume
318
