Effect of Cu concentration on the formation of Cu1-x Znx shape memory alloy thin films

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dc.authoridOZDEMIR, RASIM/0000-0003-1439-0444
dc.contributor.authorKarahan, Ismail Hakki
dc.contributor.authorOzdemir, Rasim
dc.date.accessioned2024-09-18T20:16:45Z
dc.date.available2024-09-18T20:16:45Z
dc.date.issued2014
dc.departmentHatay Mustafa Kemal Üniversitesien_US
dc.description9th Nanoscience and Nanotechnology Conference (NANOTR) -- JUN 24-28, 2013 -- Erzurum, TURKEYen_US
dc.description.abstractThe CuxZn1-x (x = 0.06, 0.08, 0.1) deposits were fabricated by a electrodeposition method. The structural and electrical properties of the films were investigated by cyclic voltammetry (CV), X-ray diffraction (XRD), Scanning electron micrograph (SEM), and DC resistivity measurements. Phase identification of the samples was studied by the XRD patterns. XRD patterns shows the characteristics XRD peaks corresponding to the, beta, and gamma phases. The grain sizes of the samples were decreased whereas microstrain increased with the increase in Cu2+ substitution. The SEM study reveals the fine particle nature of the samples with increasing Cu content. DC resistivity indicates the metallic nature of the prepared samples. It has been found that the Cu ions have a critical influence on the resultant structure and resistivity properties of the Cu-Zn samples. (C) 2014 Elsevier B.V. All rights reserved.en_US
dc.description.sponsorshipMustafa Kemal University Scientific Research Projects [MKU-BAP- 1005M 0118, 1204 D 0110]en_US
dc.description.sponsorshipFinancial support of this research by the Mustafa Kemal University Scientific Research Projects is gratefully acknowledged (MKU-BAP- 1005M 0118 and 1204 D 0110).en_US
dc.identifier.doi10.1016/j.apsusc.2014.01.119
dc.identifier.endpage104en_US
dc.identifier.issn0169-4332
dc.identifier.issn1873-5584
dc.identifier.scopus2-s2.0-84909967613en_US
dc.identifier.scopusqualityQ1en_US
dc.identifier.startpage100en_US
dc.identifier.urihttps://doi.org/10.1016/j.apsusc.2014.01.119
dc.identifier.urihttps://hdl.handle.net/20.500.12483/9727
dc.identifier.volume318en_US
dc.identifier.wosWOS:000344380500019en_US
dc.identifier.wosqualityQ1en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevier Science Bven_US
dc.relation.ispartofApplied Surface Scienceen_US
dc.relation.publicationcategoryKonferans Öğesi - Uluslararası - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectElectrodepositionen_US
dc.subjectCu-Zn alloyen_US
dc.subjectElectrical propertyen_US
dc.subjectShape memory alloysen_US
dc.titleEffect of Cu concentration on the formation of Cu1-x Znx shape memory alloy thin filmsen_US
dc.typeConference Objecten_US

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