Characterization of Al/n-ZnO/p-Si/Al structure with low-cost solution-grown ZnO layer
dc.authorid | Bayansal, Fatih/0000-0001-9600-007X | |
dc.authorid | Kahraman, suleyman/0000-0002-7730-6353 | |
dc.authorid | Cetinkaya, Samed/0000-0002-7476-9467 | |
dc.contributor.author | Cetinkaya, S. | |
dc.contributor.author | Cetinkara, H. A. | |
dc.contributor.author | Kahraman, S. | |
dc.contributor.author | Bayansal, F. | |
dc.date.accessioned | 2024-09-18T20:32:51Z | |
dc.date.available | 2024-09-18T20:32:51Z | |
dc.date.issued | 2013 | |
dc.department | Hatay Mustafa Kemal Üniversitesi | en_US |
dc.description.abstract | We report the fabrication of Al/n-ZnO/p-Si/Al diode structures with a flower-like ZnO layer. The average grain size, microstrain and dislocation density in the ZnO layer were determined as 25nm, 1.55x10(-3) and 3.23x10(13)cm(-2), respectively. From absorption spectra, the optical band gap was found to be approximate to 3.17eV. A red shift was attributed to non-stoichiometry arising from Zn+2 ions substituting for oxygen vacancies. The ideality factor was determined as 1.55. The barrier height was calculated as 0.71eV from I-V characteristics and 0.73eV using the Norde plots. | en_US |
dc.description.sponsorship | Scientific Research Commission of Mustafa Kemal University [1004 Y 0102, 1102M 0101] | en_US |
dc.description.sponsorship | This work was financially supported by the Scientific Research Commission of Mustafa Kemal University (Project Nos: 1004 Y 0102 and 1102M 0101). | en_US |
dc.identifier.doi | 10.1080/09500839.2013.820362 | |
dc.identifier.endpage | 559 | en_US |
dc.identifier.issn | 0950-0839 | |
dc.identifier.issue | 9 | en_US |
dc.identifier.scopus | 2-s2.0-84883554562 | en_US |
dc.identifier.scopusquality | Q3 | en_US |
dc.identifier.startpage | 550 | en_US |
dc.identifier.uri | https://doi.org/10.1080/09500839.2013.820362 | |
dc.identifier.uri | https://hdl.handle.net/20.500.12483/11167 | |
dc.identifier.volume | 93 | en_US |
dc.identifier.wos | WOS:000323409700007 | en_US |
dc.identifier.wosquality | Q3 | en_US |
dc.indekslendigikaynak | Web of Science | en_US |
dc.indekslendigikaynak | Scopus | en_US |
dc.language.iso | en | en_US |
dc.publisher | Taylor & Francis Ltd | en_US |
dc.relation.ispartof | Philosophical Magazine Letters | en_US |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |
dc.rights | info:eu-repo/semantics/closedAccess | en_US |
dc.subject | microelectronics | en_US |
dc.subject | optical absorption | en_US |
dc.subject | diffraction | en_US |
dc.subject | electrical conductivity | en_US |
dc.subject | ZnO | en_US |
dc.subject | diode structures | en_US |
dc.subject | SCLC | en_US |
dc.title | Characterization of Al/n-ZnO/p-Si/Al structure with low-cost solution-grown ZnO layer | en_US |
dc.type | Article | en_US |
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